Title of article - Photocurrent generation of a single-gate graphene p-n junction fabricated by interfacial modification.
Abstract
A back-gate graphene p-n junction was achieved by selective interfacial modification of a chemical vapor deposition (CVD)-grown graphene field effect transistor (FET). Silane self-assembled monolayer (SAM) patterns were used to fabricate uniform p- and n-doped regions and a sharp p-n junction in the graphene FET channel. A gate-dependent photocurrent response was observed at the graphene p-n junction, and exhibited a maximum signal between two Dirac point voltages of SAM-doped graphene regions. A spatial photocurrent map shows that the photocurrent generated at the junction region was much larger than that from graphene/electrode junctions under the same incident laser power. This single-peak characteristic photocurrent in CVD graphene is dominated by the photothermoelectric contribution, and is highly sensitive to the power of incident laser. The SAM interfacial modification method provides a feasible route for the fabrication of efficient graphene-based photodetectors.
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NTT Basic Research Laboratories, NTT Corporation, Atsugi, Kanagawa 243-0198, Japan.
Details of Journal for Photocurrent generation of a single-gate graphene p-n junction fabricated by interfacial modification.
Journal Title - Nanotechnology
ISSN - 1361-6528
Volume - 26
Issue - 38
Publish date - 2015-Sep
Language - eng
Country - England
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